High vertical resolution 3D Nanoimprint technology for nanophotonic applications

Author

Bartels, M. ; Wittzack, S. ; Köhler, F. ; Wang, X. ; Albrecht, A. ; Schudy, S. ; Engenhorst, M. ; Mai, H.H. ; Setyawati, O. ; Woit, T. ; Woidt, C. ; Hillmer, H.

Author_Institution

Inst. of Nanostruct. Technol. & Analytics (INA), Univ. of Kassel, Kassel, Germany

fYear

2009

fDate

17-20 Aug. 2009

Firstpage

87

Lastpage

88

Abstract

High vertical resolution 3D Nanoimprint technology for nanophotonic applications is presented. Opaque and transparent 3D templates with 64 different heights are fabricated. Surface roughness and structure height accuracy better than 1 nm are achieved. The conservation of these critical parameters during the 3D Nanoimprint process is proved. A Fabry-Peacuterot filter array is shown as a possible application with a filter transmittance of up to 90% and a linewidth (FWHM) of less than 3 nm.

Keywords

light transmission; nanophotonics; optical arrays; optical filters; surface roughness; 3D nanoimprint technology; Fabry-Perot filter array; critical parameters; linewidth; nanophotonics; surface roughness; transmittance; Atomic measurements; Force measurement; Lithography; Nanoscale devices; Optical filters; Optical interferometry; Optical sensors; Rough surfaces; Surface roughness; Thermal expansion; 3D Nanoimprint; high vertical resolution; nanophotonics;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS and Nanophotonics, 2009 IEEE/LEOS International Conference on

Conference_Location

Clearwater, FL

Print_ISBN

978-1-4244-2382-8

Electronic_ISBN

978-1-4244-2382-8

Type

conf

DOI

10.1109/OMEMS.2009.5338584

Filename

5338584