Title :
High vertical resolution 3D Nanoimprint technology for nanophotonic applications
Author :
Bartels, M. ; Wittzack, S. ; Köhler, F. ; Wang, X. ; Albrecht, A. ; Schudy, S. ; Engenhorst, M. ; Mai, H.H. ; Setyawati, O. ; Woit, T. ; Woidt, C. ; Hillmer, H.
Author_Institution :
Inst. of Nanostruct. Technol. & Analytics (INA), Univ. of Kassel, Kassel, Germany
Abstract :
High vertical resolution 3D Nanoimprint technology for nanophotonic applications is presented. Opaque and transparent 3D templates with 64 different heights are fabricated. Surface roughness and structure height accuracy better than 1 nm are achieved. The conservation of these critical parameters during the 3D Nanoimprint process is proved. A Fabry-Peacuterot filter array is shown as a possible application with a filter transmittance of up to 90% and a linewidth (FWHM) of less than 3 nm.
Keywords :
light transmission; nanophotonics; optical arrays; optical filters; surface roughness; 3D nanoimprint technology; Fabry-Perot filter array; critical parameters; linewidth; nanophotonics; surface roughness; transmittance; Atomic measurements; Force measurement; Lithography; Nanoscale devices; Optical filters; Optical interferometry; Optical sensors; Rough surfaces; Surface roughness; Thermal expansion; 3D Nanoimprint; high vertical resolution; nanophotonics;
Conference_Titel :
Optical MEMS and Nanophotonics, 2009 IEEE/LEOS International Conference on
Conference_Location :
Clearwater, FL
Print_ISBN :
978-1-4244-2382-8
Electronic_ISBN :
978-1-4244-2382-8
DOI :
10.1109/OMEMS.2009.5338584
