Title :
Atomic layer deposition of optical coatings inside microchannels
Author :
Gabriel, Nicholas T. ; Talghader, Joseph J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Minnesota, Minneapolis, MN, USA
Abstract :
An air wedge was created, between 2 square wafers of silicon approximately 7 cm on a side, with the air gap varying in thickness linearly from 0-1650 mum over 7 cm. A Fabry-Perot optical cavity composed of an atomic layer deposition (ALD) Al2O3/HfO2 multilayer was deposited inside the wedge, and the measured resonant wavelength only shifted by -10.3% over a distance of 6 cm along the gas flow direction and over a 118-1533 mum range of gap thickness.The first experiments to test optical coatings inside microchannels were performed using 12 cm long glass capillary tubes with an interior dimension defined by a square 500 mum opening, a 240:1 aspect ratio.
Keywords :
aluminium compounds; antireflection coatings; atomic layer deposition; hafnium compounds; micro-optomechanical devices; microchannel flow; optical films; silicon; ALD; Al2O3-HfO2; Fabry-Perot optical cavity; Si; air wedge; atomic layer deposition; distance 6 cm; microchannels; multilayer; optical coatings; resonant wavelength; size 118 mum to 1533 mum; size 12 cm; size 500 mum; Atom optics; Atomic layer deposition; Atomic measurements; Coatings; Fabry-Perot; Fluid flow measurement; Hafnium oxide; Microchannel; Nonhomogeneous media; Silicon;
Conference_Titel :
Optical MEMS and Nanophotonics, 2009 IEEE/LEOS International Conference on
Conference_Location :
Clearwater, FL
Print_ISBN :
978-1-4244-2382-8
Electronic_ISBN :
978-1-4244-2382-8
DOI :
10.1109/OMEMS.2009.5338588
