• DocumentCode
    2476247
  • Title

    Liquid immersion angled exposure for 3D photolithography

  • Author

    Sasaki, Minoru ; Hosono, Takafumi ; Kumagai, Shinya

  • Author_Institution
    Dept. of Adv. Sci. & Technol., Toyota Technol. Inst., Nagoya, Japan
  • fYear
    2009
  • fDate
    17-20 Aug. 2009
  • Firstpage
    75
  • Lastpage
    76
  • Abstract
    Photolithography on the sample surface with vertical side walls is studied. In the angled exposure for patterning side walls or bottoms, the reflection of the exposing light is necessary to be minimized for obtaining the defect-free pattern. The liquid immersion method is applied. With the polarization control, the optimum pattern is obtained using the single shot exposure.
  • Keywords
    photolithography; 3D photolithography; liquid immersion method; vertical side walls; Coatings; Degradation; Lithography; Optical films; Optical polarization; Optical reflection; Optical refraction; Reflectivity; Refractive index; Resists; 3D photolithography; Angled exposure; Liquid immersion; Vertical side wal;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical MEMS and Nanophotonics, 2009 IEEE/LEOS International Conference on
  • Conference_Location
    Clearwater, FL
  • Print_ISBN
    978-1-4244-2382-8
  • Electronic_ISBN
    978-1-4244-2382-8
  • Type

    conf

  • DOI
    10.1109/OMEMS.2009.5338590
  • Filename
    5338590
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2476247