Title :
Multiple cations interdiffusion in InGaAs/InAlAs quantum well structure and their optical gain properties
Author :
Chan, Y. ; Chan, Michael C Y
Author_Institution :
Dept. of Electr. & Electron. Eng., Hong Kong Univ., Hong Kong
Abstract :
Multiple cations intermixed In 0.53Ga 0.47As/In 0.52Al 0.48As quantum well structures with 60 Å well width are investigated using the expanded form of Fick´s second law. For a small interdiffusion, i.e. 1 to 1.5 hrs, the subband separation between the lowest heavy and light hole states is at its greatest. This is a major contribution to the band structure and averaged density of states, thus enhancement in optical gain up to 40% is obtained. For a large interdiffusion, i.e. up to 6 hrs, a blue shift of the peak gain from 0.842 to 1.016 eV is observed.
Keywords :
III-V semiconductors; aluminium compounds; band structure; chemical interdiffusion; electronic density of states; gallium arsenide; indium compounds; semiconductor quantum wells; spectral line shift; Fick´s second law; InGaAs-InAlAs; band structure; blue shift; density of states; heavy hole states; light hole states; multiple cation interdiffusion; optical gain; quantum well; subband separation; Capacitive sensors; Chirp modulation; Electrooptic modulators; High speed optical techniques; Indium compounds; Indium gallium arsenide; Indium phosphide; Lattices; Optical device fabrication; Optical materials;
Conference_Titel :
Electron Devices Meeting, 1998. Proceedings. 1998 IEEE Hong Kong
Conference_Location :
Hong Kong
Print_ISBN :
0-7803-4932-6
DOI :
10.1109/HKEDM.1998.740190