• DocumentCode
    2478125
  • Title

    A simple and meaningful expression of heterojunction built-in voltage between p-type SiGe and n-type Si

  • Author

    Kong, Deyi ; Wei, Tongli ; Li, Yao ; Nie, Weidong ; Qian, Wensheng

  • Author_Institution
    Microelectron. Center, Southeast Univ., Nanjing, China
  • fYear
    1998
  • fDate
    29-29 Aug. 1998
  • Firstpage
    97
  • Lastpage
    100
  • Abstract
    In this work, the heterojunction built-in voltage between n-type Si and strained p-type SiGe is derived from their energy band diagrams, a simple and meaningful quantitative expression is presented. For unstrained SiGe, it reduces to a more simple expression, say, it can be simply determined by the built-in voltage of Si homojunction and the bandgap narrowing of SiGe. The expression is convenient in calculation.
  • Keywords
    Ge-Si alloys; elemental semiconductors; energy gap; p-n heterojunctions; semiconductor materials; silicon; SiGe-Si; bandgap narrowing; energy band diagram; heterojunction built-in voltage; n-type Si; strained p-type SiGe; Capacitance; Frequency; Germanium silicon alloys; Heterojunctions; Microelectronics; Photonic band gap; Silicon germanium; Temperature; Voltage; Wideband;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1998. Proceedings. 1998 IEEE Hong Kong
  • Conference_Location
    Hong Kong
  • Print_ISBN
    0-7803-4932-6
  • Type

    conf

  • DOI
    10.1109/HKEDM.1998.740196
  • Filename
    740196