DocumentCode :
2478379
Title :
Fabrication and characterization of porous polycrystalline silicon resistive sensor
Author :
Han, P.G. ; Wong, H. ; Poon, M.C.
Author_Institution :
Department of Electronic Engineering, City UniversiQ, 83 Tat Chee Avenue, Kowloon, Hong Kong
fYear :
1998
fDate :
29-29 Aug. 1998
Firstpage :
152
Lastpage :
156
Abstract :
A thin layer of p-type anodized porous polycrystalline silicon (PPS) are formed on n-type epitaxial crystal silicon wafer. The sensitivity of the resistors based on this PPS has been characterized and analyzed at different ambient pressures and temperature as well as gas species. Results show that the current-voltage characteristics are highly sensitive to the ambient pressure and organic gases. In addition, the effects of illumination and temperature are also studied.
Keywords :
anodisation; electrical resistivity; elemental semiconductors; gas sensors; microsensors; porous semiconductors; pressure sensors; silicon; temperature sensors; Conductivity; Current-voltage characteristics; Fabrication; Gold; Resistors; Semiconductor films; Sensor phenomena and characterization; Silicon; Temperature sensors; Thin film sensors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1998. Proceedings. 1998 IEEE Hong Kong
Conference_Location :
Hong Kong
Print_ISBN :
0-7803-4932-6
Type :
conf
DOI :
10.1109/HKEDM.1998.740209
Filename :
740209
Link To Document :
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