• DocumentCode
    2478595
  • Title

    Virtual skin: a behavioral approach helps verification

  • Author

    Nicholle, B. ; Legendre, Arnaud ; Ferrero, Louis ; Zastrow, Leonhard

  • Author_Institution
    Syst.´´Virtual Prototyping, Sophia Antipolis, France
  • fYear
    2009
  • fDate
    17-18 Sept. 2009
  • Firstpage
    7
  • Lastpage
    12
  • Abstract
    The aim of this study is to develop a new kind of R&D methodology through a VHDL-AMS functional virtual prototype (FVP) applied to cosmetic industries. Cosmetic firms are in the process of improving R&D methodologies with more formal methods. These studies are mostly based on functional models and less laboratory testing. Hence, in cooperation with Lancaster firm, we have built for the first time a unique dynamic model of biophysical and chemical phenomenons linked to human skin and sun spectrum. Human health can be strongly influenced by exposure to solar radiation. Relevant interactions regarding to health take place mainly in the skin. So, the optics of human skin is of the utmost importance with reflection and absorption properties. By combining a sun emission light model and a bio-optical human skin model, we can compute the effects of the sun radiations on various species including free radicals generation.
  • Keywords
    bio-optics; chemical engineering computing; chemical industry; cosmetics; hardware description languages; research and development; skin; virtual reality; R&D methodology; VHDL-AMS functional virtual prototype; biooptical human skin model; cosmetic industries; free radicals generation; sun emission light model; virtual skin; Biomedical optical imaging; Chemicals; Humans; Laboratories; Skin; Solar radiation; Stimulated emission; Sun; Testing; Virtual prototyping; VHDL-AMS; free radicals; functional virtual prototyping; human skin; multi-disciplines; reactive oxygen species; solar simulator;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Behavioral Modeling and Simulation Workshop, 2009. BMAS 2009. IEEE
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-4244-5358-0
  • Type

    conf

  • DOI
    10.1109/BMAS.2009.5338897
  • Filename
    5338897