DocumentCode :
2478865
Title :
Optical waveguide photosensitivity
Author :
Hill, K.O. ; Bilodeau, F. ; Malo, B. ; Albert, J. ; Johnson, D.C.
Author_Institution :
Communication Res. Centre, Ottawa, Ont., Canada
fYear :
1993
fDate :
15-18 Nov 1993
Firstpage :
155
Lastpage :
156
Abstract :
Novel methods for photoimprinting high quality grating structures in photosensitive optical (fiber/silica-on-silicon channel) waveguides are described and evaluated
Keywords :
diffraction gratings; optical fabrication; optical fibres; optical planar waveguides; sensitivity; SiO2-Si; high quality grating structures; optical waveguide photosensitivity; photoimprinting; photosensitive optical waveguides; silica-on-silicon channel waveguides; Bragg gratings; Fiber gratings; Laser beams; Optical fiber polarization; Optical fibers; Optical modulation; Optical waveguides; Phase modulation; Resonance; Writing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1993. LEOS '93 Conference Proceedings. IEEE
Conference_Location :
San Jose, CA
Print_ISBN :
0-7803-1263-5
Type :
conf
DOI :
10.1109/LEOS.1993.379093
Filename :
379093
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2478865
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