Variable Control Design and its Application to Wafer Scanners

Author

Heertjes, Marcel ; van de Wouw, N.

Author_Institution

Philips Appl. Technol., Eindhoven

fYear

2006

fDate

13-15 Dec. 2006

Firstpage

3724

Lastpage

3729

Abstract

A variable control design is presented. The validity of such a design in dealing with linear performance trade-offs is demonstrated on a reticle stage motion system of an industrial wafer scanner. Performance is achieved by continuously balancing stability margins over disturbance rejection properties. This is done by a nonlinear state-dependent element in the feedback loop. Apart from performance, design rules and conditions to guarantee stability of the nonlinear system are considered

Keywords

Lyapunov methods; control system synthesis; feedback; nonlinear control systems; stability; Lurie-Postnikov form; Lyapunov stability; feedback loop; industrial wafer scanner; nonlinear control system; nonlinear state-dependent element; reticle stage motion system; stability margin; variable control design; variable gain; Control design; Control systems; Electrical equipment industry; Feedback; Gain; Industrial control; Nonlinear control systems; Optical variables control; Servomechanisms; Stability; Lurie-Postnikov form; Lyapunov stability; nonlinear control; stability margins; variable gains;

fLanguage

English

Publisher

ieee

Conference_Titel

Decision and Control, 2006 45th IEEE Conference on

Conference_Location

San Diego, CA

Print_ISBN

1-4244-0171-2

Type

conf

DOI

10.1109/CDC.2006.377406

Filename

4177777