DocumentCode
2479309
Title
High Performance RF Integrated Circuits using the Silicon Based RE Integrated Passive Device (RFIPD)
Author
Nam, Choong-Mo ; Jung, In-Ho
Author_Institution
Dept. of Electr. Eng., Korea Polytech. Univ., Gyunggi-Do
fYear
0
fDate
0-0 0
Firstpage
1357
Lastpage
1361
Abstract
In this paper, we introduce the high performance RF circuits using the RF integrated passive device (RFIPD). RFIPD is made by a low-cost manufacturing technology and a high-performance process technology of electro-chemically forming thick oxide layer on silicon wafer and processing Cu thick metal and BCB. Several RF integrated passive circuits and RF module such as LPF, BPF, balun and RF receiver module are fabricated using this new technology and they show good RF performance in spite of their small chip size
Keywords
integrated circuit manufacture; monolithic integrated circuits; radiofrequency integrated circuits; silicon; RF integrated passive device; electro-chemical process; high-performance process technology; manufacturing technology; radiofrequency integrated circuit; silicon based RFIPD; Band pass filters; Costs; Impedance matching; Integrated circuit technology; Organic materials; Packaging; Radio frequency; Radiofrequency integrated circuits; Reliability engineering; Silicon; RF circuits; RFIPD; Silicon substrate;
fLanguage
English
Publisher
ieee
Conference_Titel
Information, Communications and Signal Processing, 2005 Fifth International Conference on
Conference_Location
Bangkok
Print_ISBN
0-7803-9283-3
Type
conf
DOI
10.1109/ICICS.2005.1689278
Filename
1689278
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