DocumentCode
2479498
Title
Residual Analysis for Fingerprint Orientation Modeling
Author
Jirachaweng, Suksan ; Hou, Zujun ; Li, Jun ; Yau, Wei-Yun ; Areekul, Vutipong
Author_Institution
Dept. of Electr. Eng., Kasetsart Univ., Bangkok, Thailand
fYear
2010
fDate
23-26 Aug. 2010
Firstpage
1196
Lastpage
1199
Abstract
This paper presents a novel method for fingerprint orientation modeling, which executes in two phases. Firstly, the orientation field is reconstructed through fitting to a lower order Legendre polynomial basis to capture the global orientation pattern. Then the preliminary model around the singular region is dynamically refined by fitting to a higher order Legendre polynomial basis. The singular region is automatically detected through the analysis on the orientation residual field between the original orientation field and the orientation model. The method has been evaluated using the FVC 2004 data sets and compared with state-of-the-arts. Experiments turn out that the propose method attains higher accuracy in fingerprint matching and singularity preservation.
Keywords
Legendre polynomials; fingerprint identification; image matching; FVC 2004 data sets; fingerprint matching; fingerprint orientation modeling; global orientation pattern; higher order Legendre polynomial basis; lower order Legendre polynomial basis; orientation field; orientation residual field; original orientation field; residual analysis; Analytical models; Computational modeling; Estimation; Fingerprint recognition; Image matching; Polynomials;
fLanguage
English
Publisher
ieee
Conference_Titel
Pattern Recognition (ICPR), 2010 20th International Conference on
Conference_Location
Istanbul
ISSN
1051-4651
Print_ISBN
978-1-4244-7542-1
Type
conf
DOI
10.1109/ICPR.2010.298
Filename
5595888
Link To Document