Title :
Residual Analysis for Fingerprint Orientation Modeling
Author :
Jirachaweng, Suksan ; Hou, Zujun ; Li, Jun ; Yau, Wei-Yun ; Areekul, Vutipong
Author_Institution :
Dept. of Electr. Eng., Kasetsart Univ., Bangkok, Thailand
Abstract :
This paper presents a novel method for fingerprint orientation modeling, which executes in two phases. Firstly, the orientation field is reconstructed through fitting to a lower order Legendre polynomial basis to capture the global orientation pattern. Then the preliminary model around the singular region is dynamically refined by fitting to a higher order Legendre polynomial basis. The singular region is automatically detected through the analysis on the orientation residual field between the original orientation field and the orientation model. The method has been evaluated using the FVC 2004 data sets and compared with state-of-the-arts. Experiments turn out that the propose method attains higher accuracy in fingerprint matching and singularity preservation.
Keywords :
Legendre polynomials; fingerprint identification; image matching; FVC 2004 data sets; fingerprint matching; fingerprint orientation modeling; global orientation pattern; higher order Legendre polynomial basis; lower order Legendre polynomial basis; orientation field; orientation residual field; original orientation field; residual analysis; Analytical models; Computational modeling; Estimation; Fingerprint recognition; Image matching; Polynomials;
Conference_Titel :
Pattern Recognition (ICPR), 2010 20th International Conference on
Conference_Location :
Istanbul
Print_ISBN :
978-1-4244-7542-1
DOI :
10.1109/ICPR.2010.298