DocumentCode
2480824
Title
Automatic landmark location with a Combined Active Shape Model
Author
Zhou, Dianle ; Petrovska-Delacrétaz, Dijana ; Dorizzi, Bernadette
fYear
2009
fDate
28-30 Sept. 2009
Firstpage
1
Lastpage
7
Abstract
Automatic facial landmark location is a difficult challenge for realistic face recognition applications, where the face is recorded under variable illumination conditions including indoor and outdoor recordings and also with some pose and scale variability. Moreover, the image distortion and complex background also bring some difficulty both for landmark location and face recognition. The proposed landmark detection method, called combined active shape models, is robust to illumination, translation, and rotation. It exploits the scale invariant feature transform (SIFT) [1] and the active shape model (ASM). In order to have a better representation of face images, the landmarks on the face region and the face contour are modeled and processed separately. The performance of the proposed combined-ASM algorithm is tested on the BioID and FRGCv2.0 face image databases.
Keywords
computational geometry; distortion; edge detection; face recognition; feature extraction; image representation; pose estimation; realistic images; shape recognition; BioID face image database; FRGCv2.0 face image database; SIFT; automatic facial landmark location; combined active shape model; combined-ASM algorithm; complex background; face contour model; face region image representation; feature extraction; image distortion; image rotation; image translation; indoor recording; landmark detection method; outdoor recording; pose variability; realistic face recognition application; scale invariant feature transform; scale variability; variable illumination condition; Active shape model; Eyes; Face detection; Face recognition; Image databases; Lighting; Mouth; Principal component analysis; Robustness; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Biometrics: Theory, Applications, and Systems, 2009. BTAS '09. IEEE 3rd International Conference on
Conference_Location
Washington, DC
Print_ISBN
978-1-4244-5019-0
Electronic_ISBN
978-1-4244-5020-6
Type
conf
DOI
10.1109/BTAS.2009.5339037
Filename
5339037
Link To Document