Title :
Dependency of growth of Arabidopsis thaliana on intensity of D.C. electric field
Author :
Okumura, Takamasa ; Muramoto, Yuji ; Shimizu, Noriyuki
Author_Institution :
Dept. of Electr. & Electron. Eng., Meijo Univ., Nagoya, Japan
Abstract :
We have studied the influence of electric field on plant growth. In previous papers, we reported that the D.C. electric field increases the seed germination rate, weight and length of daikon radish. We also obtain the similar effects for thale cress. It is reasonable to expect that there is an optimum intensity of D.C. electric field for plant growth improvement. As the first step to seek out the optimum intensity, the seeds of thale cress were cultivated under three circumstances; 0.0kV/m, 2.5kV/m, and 10.0kV/m of D.C. field. As a result, the growth is most increased by the 10.0kV/m; therefore, we estimated the optimum intensity to be higher than 2.5kV/m. In this paper, the detailed dependency of the growth of thale cress on the intensity of the D.C. electric field is studied.
Keywords :
biological effects of fields; botany; DC electric field; arabidopsis thaliana growth; daikon radish length; daikon radish weight; plant growth improvement; seed germination rate; Acceleration; Corona; Discharges (electric); Electric fields; Electrodes; Electrostatics; Plasmas;
Conference_Titel :
Electrical Insulation and Dielectric Phenomena (CEIDP), 2012 Annual Report Conference on
Conference_Location :
Montreal, QC
Print_ISBN :
978-1-4673-1253-0
Electronic_ISBN :
0084-9162
DOI :
10.1109/CEIDP.2012.6378769