• DocumentCode
    2483741
  • Title

    Influence of the Schottky pad in semi-insulating GaAs on the Schottky barrier in the active layer

  • Author

    Wu, J. ; Wang, Z.G. ; Zhang, M. ; Fan, T.W. ; Lin, L.Y.

  • Author_Institution
    Inst. of Semicond., Acad. Sinica, Beijing, China
  • fYear
    1996
  • fDate
    29 Apr-3 May 1996
  • Firstpage
    349
  • Lastpage
    352
  • Abstract
    It is observed that the sidegate voltage has an influence on the gate barrier of FETs and the behavior of leakage current in substrates via the gate metal pad lying on the semi-insulating GaAs substrate. A simple mechanism is proposed to interpret the observation
  • Keywords
    III-V semiconductors; Schottky barriers; Schottky gate field effect transistors; crosstalk; gallium arsenide; leakage currents; GaAs; MESFET; Schottky barrier; Schottky pad; active layer; crosstalk; gate barrier; gate metal pad; leakage current; semi-insulating GaAs; sidegate voltage; Atherosclerosis; Capacitance; Capacitance-voltage characteristics; FETs; Gallium arsenide; Leakage current; Schottky barriers; Space charge; Substrates; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconducting and Semi-Insulating Materials Conference, 1996. IEEE
  • Conference_Location
    Toulouse
  • Print_ISBN
    0-7803-3179-6
  • Type

    conf

  • DOI
    10.1109/SIM.1996.571117
  • Filename
    571117