• DocumentCode
    2484707
  • Title

    A high perforation ability of TEA CO2 laser for PEEK ablation

  • Author

    Sumiyoshi, Tetsumi ; Ninomiya, Yutaka ; Ogasawara, Hiroshi ; Obara, Minoru

  • Author_Institution
    Dept. of Electr. Eng., Keio Univ., Yokohama, Japan
  • fYear
    1993
  • fDate
    15-18 Nov 1993
  • Firstpage
    768
  • Lastpage
    769
  • Abstract
    Polyether ether ketone (PEEK) is one of the thermoplastic materials with high performance with regard to thermal and chemical stability, which is expected to replace metallic materials in industrial fields. In this paper, the demonstration of PEEK ablation by a TEA C0 2 laser is reported and PEEK ablation at a high fluence (>10 J/cm2) is discussed in terms of fluence dependence of the etch rate and ambient gas effect
  • Keywords
    etching; laser ablation; laser beam etching; polymers; CO2; PEEK ablation; TEA CO2 laser; ambient gas effect; chemical stability; etch rate; perforation; polyether ether ketone; thermal stability; thermoplastic materials; Absorption; Chemical lasers; Etching; Gas lasers; Laser ablation; Laser theory; Laser tuning; Optical materials; Optical pulses; Polymers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Society Annual Meeting, 1993. LEOS '93 Conference Proceedings. IEEE
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    0-7803-1263-5
  • Type

    conf

  • DOI
    10.1109/LEOS.1993.379418
  • Filename
    379418