DocumentCode :
2489841
Title :
Domain modeling of software process models
Author :
Gomaa, Hassan ; Kerschberg, Larry ; Farrukh, Ghulam A.
Author_Institution :
George Mason Univ., Fairfax, VA, USA
fYear :
2000
fDate :
2000
Firstpage :
50
Lastpage :
60
Abstract :
The paper presents a novel application involving two important software engineering research areas: process modeling and software reuse. The Spiral Model is a risk-driven process model, which, depending on the specific risks associated with a given project, may be tailored to create a project-specific process model. The software reuse area is that of domain modeling of families of systems, which capture the similarities and variations among the members of the family. The domain modeling approach is used to create a domain model of a Spiral Process Model (SPM), thereby capturing the similarities and variations among a family of process models. The SPM domain model has been extended to capture the key process areas of the Software Engineering Institute´s Capability Maturity Model (CMM). The domain model is used to generate project-specific process models. This approach allows managers to configure and reuse process models that manage the risks associated with new software development
Keywords :
configuration management; risk management; software development management; software process improvement; software reusability; CMM; Capability Maturity Model; SPM domain model; Spiral Process Model; domain model; domain modeling; domain modeling approach; process modeling; project-specific process model; project-specific process models; risk management; risk-driven process model; software development; software engineering research areas; software process models; software reuse; Aggregates; Coordinate measuring machines; Jacobian matrices; Joining processes; Kernel; Libraries; Object oriented modeling; Programming; Software testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Engineering of Complex Computer Systems, 2000. ICECCS 2000. Proceedings. Sixth IEEE International Conference on
Conference_Location :
Tokyo
Print_ISBN :
0-7695-0583-X
Type :
conf
DOI :
10.1109/ICECCS.2000.873927
Filename :
873927
Link To Document :
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