DocumentCode :
2490887
Title :
Analysis of deep etched trench in planar optical waveguide by FDTD method
Author :
Wang, Jun ; Li, Mingyu ; He, Jian-Jun
Author_Institution :
Zhejiang Univ., Hangzhou
fYear :
2007
fDate :
17-19 Oct. 2007
Firstpage :
218
Lastpage :
220
Abstract :
A finite-difference time-domain (FDTD) method is presented for simulating deep etched trench structures in planar optical waveguides. Numerical results obtained from FDTD simulations and from the transfer matrix method (TMM) are compared. The effect of sidewall verticality is analyzed.
Keywords :
etching; finite difference time-domain analysis; optical planar waveguides; transfer function matrices; FDTD method; deep etched trench; finite-difference time-domain method; planar optical waveguide; sidewall verticality; transfer matrix method; Etching; Finite difference methods; Optical buffering; Optical filters; Optical planar waveguides; Optical waveguides; Planar waveguides; Propagation losses; Time domain analysis; Transmission line matrix methods;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical Fiber Communication and Optoelectronics Conference, 2007 Asia
Conference_Location :
Shanghai
Print_ISBN :
978-0-9789217-2-9
Electronic_ISBN :
978-0-9789217-2-9
Type :
conf
DOI :
10.1109/AOE.2007.4410758
Filename :
4410758
Link To Document :
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