Design of a 100 kV, 200 ampere, 2 kilohertz single “Hobetron” tube modulator for industrial plasma source ion implantation applications

This paper presents an advanced plasma source ion implantation (PSII) modulator system which takes advantage of a novel high power electron beam switch tube called the “Hobetron” (derived from hollow electron beam). The authors describe this tube and outline features which render it so well-suited for use in PSII modulators. The Hobetron has been developed from similar beam switch tubes of proven reliability, and when coupled with an evolutionary modulator design, should provide a system of long life and reliable operation