• DocumentCode
    2492751
  • Title

    Fabrication and characterization of deeply-etched SiO2 waveguides

  • Author

    Sheng, Zhen ; Yang, Liu ; Dai, Daoxin ; Lang, Tingting ; Wang, Zhechao

  • Author_Institution
    Zhejiang Univ., Hangzhou
  • fYear
    2007
  • fDate
    17-19 Oct. 2007
  • Firstpage
    517
  • Lastpage
    519
  • Abstract
    Deeply-etched SiO2 waveguide is fabricated and characterized. The fabrication process is easier than the conventional buried SiO2 waveguide. The fabricated waveguide exhibits good performances, such as low propagation loss, broad band.
  • Keywords
    etching; optical fibre fabrication; silicon compounds; SiO2; buried SiO2 waveguide; deeply-etched SiO2 waveguides; optical fibre fabrication; Electromagnetic waveguides; Etching; Optical buffering; Optical device fabrication; Optical losses; Optical scattering; Optical waveguides; Propagation losses; Silicon compounds; Wavelength measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical Fiber Communication and Optoelectronics Conference, 2007 Asia
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-0-9789217-2-9
  • Electronic_ISBN
    978-0-9789217-2-9
  • Type

    conf

  • DOI
    10.1109/AOE.2007.4410860
  • Filename
    4410860
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2492751