DocumentCode :
2495995
Title :
Electrical determination of bandgap narrowing and parasitic energy barriers in SiGe and SiGeC heterojunction bipolar transistors
Author :
Anteney, I.M. ; Lippert, G. ; Ashburn, P. ; Osten, H.J. ; Heinemann, B. ; Parker, G.J.
Author_Institution :
Dept. of Electron. & Comput. Sci., Southampton Univ., UK
fYear :
1997
fDate :
24-25 Nov 1997
Firstpage :
55
Lastpage :
60
Abstract :
A novel electrical method is described which allows the extraction of bandgap narrowing within the base of SiGe heterojunction bipolar transistors due to heavy doping effects and the presence of germanium. In addition it is shown that the method´s sensitivity to doping tails makes it ideal for determining the presence of parasitic energy barriers due to B outdiffusion from the base, a cause of major concern for HBT technology. The analysis is applied to SiGe and SiGeC HBTs showing that background carbon incorporation (≈1020 m-3) completely suppresses TED
Keywords :
Ge-Si alloys; diffusion; energy gap; heavily doped semiconductors; heterojunction bipolar transistors; microwave bipolar transistors; semiconductor device reliability; semiconductor materials; B outdiffusion; Gummel plots; HBT reliability; SiGe; SiGe HBTs; SiGeC; SiGeC HBTs; TED suppression; background C incorporation; bandgap narrowing; doping tails; electrical determination; heavy doping effects; parasitic energy barriers; Boron; Energy barrier; Fabrication; Frequency; Germanium silicon alloys; Heterojunction bipolar transistors; Photonic band gap; Silicon germanium; Temperature; Thermal conductivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
High Performance Electron Devices for Microwave and Optoelectronic Applications, 1997. EDMO. 1997 Workshop on
Conference_Location :
London
Print_ISBN :
0-7803-4135-X
Type :
conf
DOI :
10.1109/EDMO.1997.668507
Filename :
668507
Link To Document :
بازگشت