DocumentCode :
2496887
Title :
Understanding pulsed IV measurement waveforms
Author :
Baylis, C.P. ; Dunleavy, Lawrence P.
Author_Institution :
Dept. of Electr. Eng., South Florida Univ., Tampa, FL, USA
fYear :
2003
fDate :
17-18 Nov. 2003
Firstpage :
223
Lastpage :
228
Abstract :
Pulsed IV analysis allows the development of more accurate nonlinear models for RF and microwave device operation. An analysis of pulsed IV waveform allows better exploitation of measurement capabilities to produce accurate results. Static and dynamic IV measurement waveforms produced by a commercially available pulsed IV analyzer are examined. Because transistors can become unstable during any type of IV measurement, the use of bias tees allows a frequency-dependent impedance to be presented. However, it is shown that care must be used when using bias tees in pulsed IV measurement to choose a bias tee with an inductor time constant significantly higher than the pulsing frequency but lower than the frequency at which oscillations develop.
Keywords :
electric current measurement; pulse measurement; voltage measurement; waveform analysis; RF device; bias tees; dynamic IV measurement waveforms; frequency-dependent impedance; inductor time; microwave device operation; nonlinear models; pulsed IV analyzer; pulsed IV measurement; pulsing frequency; static IV measurement waveforms; transistors; Current measurement; Frequency measurement; HEMTs; Inductors; MODFETs; Performance evaluation; Pulse measurements; Temperature; Time measurement; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices for Microwave and Optoelectronic Applications, 2003. EDMO 2003. The 11th IEEE International Symposium on
Print_ISBN :
0-7803-7904-7
Type :
conf
DOI :
10.1109/EDMO.2003.1260055
Filename :
1260055
Link To Document :
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