• DocumentCode
    2497093
  • Title

    Aerosol deposition and combined dry/wet etching techniques for fabrication of InP-based quantum dot structures

  • Author

    Maximov, I. ; Gustafsson, A. ; Hansson, H.-C. ; Samuelson, L. ; Seifert, W. ; Wiedensohler, A.

  • Author_Institution
    Lund Univ., Sweden
  • fYear
    1993
  • fDate
    19-22 Apr 1993
  • Firstpage
    727
  • Lastpage
    730
  • Abstract
    The authors present a novel technology for the fabrication of quantum dots (QDs) structures based on the deposition of ultrafine aerosol Ag particles onto the surface of Ga0.47In0.53 As/InP quantum well structures grown by metal organic vapor phase epitaxy. The quantum well structures consisted of 3 quantum wells (QWs) with nominal thickness of 3, 8 and 18 monolayers with the thinnest QW being on top of the structure. A reference layer of Ga0.47In 0.53As was grown below QWs for lattice matching control. The QWs were separated by 15 nm barriers of InP and the cladding layer was about 66 nm in thickness. Silver particles 40 nm in diameter were used as an etching mask. QW thickness dependence of quenching of QD luminescence was observed
  • Keywords
    III-V semiconductors; aerosols; cathodoluminescence; etching; gallium arsenide; indium compounds; photoluminescence; radiation quenching; semiconductor growth; semiconductor quantum dots; sputter etching; vapour phase epitaxial growth; InP-based quantum dot structures; QW thickness dependence; aerosol deposition; cathodoluminescence; cladding layer; combined dry/wet etching techniques; etching mask; fabrication; lattice matching control; luminescence; metal organic vapor phase epitaxy; photoluminescence; quantum well structures; reference layer; ultrafine aerosol Ag particles; Aerosols; Epitaxial growth; Epitaxial layers; Fabrication; Indium phosphide; Plasma applications; Plasma stability; Quantum dots; US Department of Transportation; Wet etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 1993. Conference Proceedings., Fifth International Conference on
  • Conference_Location
    Paris
  • Print_ISBN
    0-7803-0993-6
  • Type

    conf

  • DOI
    10.1109/ICIPRM.1993.380541
  • Filename
    380541