• DocumentCode
    2498750
  • Title

    Fully self-aligned InP/InGaAs heterojunction bipolar transistors grown by chemical beam epitaxy with a Schottky collector

  • Author

    Pelouard, J.L. ; Matine, N. ; Pardo, F. ; Sachelarie, D. ; Benchimol, J.L.

  • Author_Institution
    L2M-CNRS, Bagneux, France
  • fYear
    1993
  • fDate
    19-22 Apr 1993
  • Firstpage
    393
  • Lastpage
    396
  • Abstract
    A new HBT design for reduction of parasitic effects has been developed to demonstrate the ability of ballistic and quasi-ballistic electron transport into the base to improve HBT dynamic behavior. To reduce both the transit time and the charging time of the base-collector junction electrons are collected by a Schottky contact. As a result the transistor must be collector-up. A fully self-aligned process has been developed for collector-up HBTs. This small cross-type HBT exhibits an attractive potential for fast dynamic behavior. Static behavior has been characterized on test structures grown by chemical beam epitaxy. It has been shown that current injected by the emitter-base junction flows mainly at junction perimeter. Also, it has been demonstrated that the extrinsic base must be over-doped by ion implantation to have small enough access resistance to the base for good dynamic behavior. Static current gains up to 50 have measured for the shortest junction perimeters
  • Keywords
    III-V semiconductors; Schottky barriers; chemical beam epitaxial growth; gallium arsenide; heterojunction bipolar transistors; indium compounds; ion implantation; semiconductor growth; CBE; HBT; InP-InGaAs; Schottky collector; ballistic electron transport; base-collector junction; charging time; chemical beam epitaxy; fast dynamic behavior; fully self-aligned process; ion implantation; parasitic effects; quasi-ballistic electron transport; semiconductors; static current gains; transit time; Chemicals; Electrons; Epitaxial growth; Heterojunction bipolar transistors; Indium gallium arsenide; Indium phosphide; Ion implantation; Molecular beam epitaxial growth; Schottky barriers; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 1993. Conference Proceedings., Fifth International Conference on
  • Conference_Location
    Paris
  • Print_ISBN
    0-7803-0993-6
  • Type

    conf

  • DOI
    10.1109/ICIPRM.1993.380626
  • Filename
    380626