DocumentCode :
2498750
Title :
Fully self-aligned InP/InGaAs heterojunction bipolar transistors grown by chemical beam epitaxy with a Schottky collector
Author :
Pelouard, J.L. ; Matine, N. ; Pardo, F. ; Sachelarie, D. ; Benchimol, J.L.
Author_Institution :
L2M-CNRS, Bagneux, France
fYear :
1993
fDate :
19-22 Apr 1993
Firstpage :
393
Lastpage :
396
Abstract :
A new HBT design for reduction of parasitic effects has been developed to demonstrate the ability of ballistic and quasi-ballistic electron transport into the base to improve HBT dynamic behavior. To reduce both the transit time and the charging time of the base-collector junction electrons are collected by a Schottky contact. As a result the transistor must be collector-up. A fully self-aligned process has been developed for collector-up HBTs. This small cross-type HBT exhibits an attractive potential for fast dynamic behavior. Static behavior has been characterized on test structures grown by chemical beam epitaxy. It has been shown that current injected by the emitter-base junction flows mainly at junction perimeter. Also, it has been demonstrated that the extrinsic base must be over-doped by ion implantation to have small enough access resistance to the base for good dynamic behavior. Static current gains up to 50 have measured for the shortest junction perimeters
Keywords :
III-V semiconductors; Schottky barriers; chemical beam epitaxial growth; gallium arsenide; heterojunction bipolar transistors; indium compounds; ion implantation; semiconductor growth; CBE; HBT; InP-InGaAs; Schottky collector; ballistic electron transport; base-collector junction; charging time; chemical beam epitaxy; fast dynamic behavior; fully self-aligned process; ion implantation; parasitic effects; quasi-ballistic electron transport; semiconductors; static current gains; transit time; Chemicals; Electrons; Epitaxial growth; Heterojunction bipolar transistors; Indium gallium arsenide; Indium phosphide; Ion implantation; Molecular beam epitaxial growth; Schottky barriers; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1993. Conference Proceedings., Fifth International Conference on
Conference_Location :
Paris
Print_ISBN :
0-7803-0993-6
Type :
conf
DOI :
10.1109/ICIPRM.1993.380626
Filename :
380626
Link To Document :
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