DocumentCode :
2499599
Title :
Hot-electron-induced minority carrier generation in bipolar junction transistors
Author :
Ishiuchi, H. ; Tamba, N. ; Shott, J.D. ; Knorr, C.J. ; Wong, S.S.
Author_Institution :
Integrated Circuits Lab., Stanford Univ., CA, USA
fYear :
1989
fDate :
3-6 Dec. 1989
Firstpage :
803
Lastpage :
806
Abstract :
The authors report the observation and analysis of minority carrier generation in the collector and the substrate of n-p-n bipolar junction transistors as a result of photons which are generated in the collector-base depletion region. Both the substrate current and the additional leakage current in an adjacent n/sup +/-p junction peak at V/sub BE/ approximately=0.8 V. In the authors´ model of the phenomena, the photons induce carriers both in the depletion region and in the neutral region. The generated minority carriers in the neutral region diffuse and contribute to the substrate current and the junction leakage current.<>
Keywords :
bipolar transistors; hot carriers; semiconductor device models; collector-base depletion region; hot electron induced minority carrier generation; junction leakage current; leakage current; models; n-p-n bipolar junction transistors; neutral region; photon generation; photons induce carriers; substrate current; Bipolar transistor circuits; Current measurement; Doping; Laboratories; Leakage current; MOSFETs; Photonic integrated circuits; Semiconductor process modeling; Substrates; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1989. IEDM '89. Technical Digest., International
Conference_Location :
Washington, DC, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-0817-4
Type :
conf
DOI :
10.1109/IEDM.1989.74175
Filename :
74175
Link To Document :
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