DocumentCode :
2499767
Title :
Automatic classification of wafer defects: status and industry needs
Author :
Shapiro, Arye
Author_Institution :
SEMATECH, Austin, TX, USA
fYear :
1996
fDate :
14-16 Oct 1996
Firstpage :
117
Lastpage :
122
Abstract :
This paper describes the Automatic Defect Classification (ADC) beta site evaluations performed as part of the SEMATECH ADC project. Two optical review microscopes equipped with ADC software were independently evaluated in manufacturing environments. Both microscopes were operated in bright-field mode with white light illumination. ADC performance was measured on three process levels of random logic devices: source/drain, polysilicon gate, and metal. ADC performance metrics included classification accuracy, repeatability, and speed. In particular, ADC software was tested using a protocol that included knowledge base tests, gauge studies, and small passive data collections
Keywords :
automatic optical inspection; integrated circuit manufacture; optical microscopy; pattern classification; SEMATECH ADC project; automatic defect classification; beta site evaluations; bright-field mode; classification accuracy; classification speed; gauge studies; knowledge base tests; manufacturing environments; optical review microscopes; passive data collections; performance metrics; repeatability; semiconductor wafer defects; white light illumination; High speed optical techniques; Inspection; Lighting; Logic devices; Manufacturing; Measurement; Optical microscopy; Optical sensors; Scanning electron microscopy; Software testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Manufacturing Technology Symposium, 1996., Nineteenth IEEE/CPMT
Conference_Location :
Austin, TX
ISSN :
1089-8190
Print_ISBN :
0-7803-3642-9
Type :
conf
DOI :
10.1109/IEMT.1996.559702
Filename :
559702
Link To Document :
بازگشت