DocumentCode
2499783
Title
Influence of the thickness on structural, magnetic and electrical properties of BiFeO3 -PbTiO3 thin film prepared by pulsed laser deposition
Author
Bygrave, Faye ; Comyn, Tim P. ; Bell, Andrew J.
Author_Institution
Inst. for Mater. Res., Univ. of Leeds, Leeds, UK
fYear
2010
fDate
9-12 Aug. 2010
Firstpage
1
Lastpage
4
Abstract
Single phase BiFeO3-PbTiO3 films around the morphotropic phase boundary were deposited by pulsed laser deposition on polycrystalline and (111) orientated Pt/TiOx/SiO2/Si substrates. X-ray and pole figure analysis confirms that 0.6BiFeO3-0.4PbTiO3 films are 100 preferentially orientated up to ~1.3 μm, whilst 0.7BiFeO3-0.3PbTiO3 films are preferentially 111 orientated up to ~290nm and become polycrystalline above ~460 nm. For all films the rms roughness decreases with increasing thickness up to the critical thickness of ~290 nm. Below ~290 nm all films appear to be conductive, however above ~290 nm the films appear resistive with the piezoelectric and magnetic nature being demonstrated through PFM and MFM. TEM EDX analysis confirms the destruction of the Pt bottom electrode with interdiffusion between the Bi and Pt. 0.7BiFeO3-0.3PbTiO3 films above the critical thickness were deposited on to an SRO buffer layre-Pt/TiOx/SiO2/Si. TEM EDX analysis confirm that the SRO buffer layer prevents interdiffusion at the interface, producing resistive films with a piezoelectric response. This paper discusses how the growth of the films up to the critical thickness, as well as interdiffusion between the Pt and Bi, has an impact on the films properties.
Keywords
Curie temperature; X-ray chemical analysis; antiferromagnetic materials; bismuth compounds; buffer layers; chemical interdiffusion; lead compounds; magnetic force microscopy; magnetic thin films; piezoelectric thin films; pulsed laser deposition; transmission electron microscopy; BiFeO3-PbTiO3; EDX; MFM; PFM; Pt-TiOx-SiO2-Si; Si; TEM; X-ray analysis; buffer layers; electrical properties; interdiffusion; magnetic properties; morphotropic phase boundary; piezoelectricity; pole figure analysis; pulsed laser deposition; resistive films; rms roughness; structure; thickness dependence; thin film; Lead; Magnetic films; Silicon; Surface treatment; Pulsed laser deposition; bismuth ferrite; interdiffusion; lead titanate; thickness dependence; thin film;
fLanguage
English
Publisher
ieee
Conference_Titel
Applications of Ferroelectrics (ISAF), 2010 IEEE International Symposium on the
Conference_Location
Edinburgh
ISSN
1099-4734
Print_ISBN
978-1-4244-8190-3
Electronic_ISBN
1099-4734
Type
conf
DOI
10.1109/ISAF.2010.5712246
Filename
5712246
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