DocumentCode
2499822
Title
A closed-form analysis of f/sub T/ for the bipolar transistor down to liquid nitrogen temperature
Author
Tamba, N. ; Weybright, M.E. ; Shott, J.D. ; Plummer, J.D.
Author_Institution
Integrated Circuit Lab., Stanford Univ., CA, USA
fYear
1989
fDate
3-6 Dec. 1989
Firstpage
807
Lastpage
810
Abstract
A simple closed-form expression for f/sub T/ (cutoff frequency) down to liquid nitrogen temperature has been determined by examining the emitter-collector transit time, t/sub ec/, where f/sub T/=1/(2 pi t/sub ec/). This closed-form expression gives excellent agreement with measured values for polysilicon emitter n-p-n transistors which have been fabricated with Stanford´s triple-diffused BiCMOS process. It is shown that the BJT (bipolar junction transistor) f/sub T/ behavior over temperature is primarily determined by only three terms: the base minority carrier storage time, the emitter minority carrier storage time, and the base-collector space-charge-layer storage time. The match of experimental data with the closed-form f/sub T/ expression shows that an increase in the base transit time in compensated BJT base regions at low temperature due to minority carrier trapping does occur and is the main reason for the degradation of f/sub T/ at temperatures lower than 150 K in the devices considered.<>
Keywords
BIMOS integrated circuits; bipolar transistors; semiconductor device models; 300 to 77 K; BJT; base minority carrier storage time; base transit time; base-collector space-charge-layer storage time; bipolar junction transistor; bipolar transistor; closed-form expression; compensated BJT base regions; cutoff frequency; degradation of f/sub T/; emitter minority carrier storage time; emitter-collector transit time; experimental data; f/sub T/; liquid N/sub 2/ temperature; low temperature; minority carrier trapping; polycrystalline Si emitter; polysilicon emitter n-p-n transistors; triple-diffused BiCMOS process; BiCMOS integrated circuits; Bipolar transistors; CMOS technology; Degradation; Laboratories; MOSFETs; Nitrogen; Space charge; Tellurium; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1989. IEDM '89. Technical Digest., International
Conference_Location
Washington, DC, USA
ISSN
0163-1918
Print_ISBN
0-7803-0817-4
Type
conf
DOI
10.1109/IEDM.1989.74176
Filename
74176
Link To Document