Title :
Modulations in alternated tensile/compressive strained GaInAsP multilayer grown by gas source molecular beam epitaxy
Author :
Ponchet, A. ; Rocher, A. ; Emery, J.Y. ; Starck, C. ; Goldstein, L.
Author_Institution :
CEMES-LOE/CNRS, Toulouse, France
Abstract :
Zero-net strained GaInAsP multiple quantum wells grown by gas source molecular beam epitaxy exhibit altered structural and optical properties when tensile barriers are introduced instead of lattice matched ones. Transmission electron microscopy observations have revealed that a modulation of thickness, strain, and probably chemical composition within the layers are responsible for this degradation. The modulation is strongly anisotropic with a period of 50 nm along the [110] direction. Although it is not yet entirely clear, the comparison with relaxed systems and with elastic relaxation models permits a conclusion that this mechanism is induced by a partial relaxation of strain. The amplification of the modulation as well as the opposite behavior between tensile and compressive layers are explained in this manner
Keywords :
III-V semiconductors; chemical beam epitaxial growth; compressibility; deformation; gallium arsenide; indium compounds; optical properties; semiconductor growth; semiconductor quantum wells; stoichiometry; transmission electron microscopy; GaInAsP; TEM; compressive layers; degradation; elastic relaxation models; gas source molecular beam epitaxy; modulation amplification; multiple quantum wells; optical properties; strain relaxation; structure; tensile barriers; Anisotropic magnetoresistance; Capacitive sensors; Chemicals; Degradation; Electron optics; Geometrical optics; Lattices; Molecular beam epitaxial growth; Optical modulation; Transmission electron microscopy;
Conference_Titel :
Indium Phosphide and Related Materials, 1993. Conference Proceedings., Fifth International Conference on
Conference_Location :
Paris
Print_ISBN :
0-7803-0993-6
DOI :
10.1109/ICIPRM.1993.380679