DocumentCode :
2499880
Title :
Effect of growth condition on electrical properties of MBE and MOCVD-AlInAs
Author :
Luo, J.K. ; Thomas, H.
Author_Institution :
Coll. of Cardiff, Univ. of Wales, UK
fYear :
1993
fDate :
19-22 Apr 1993
Firstpage :
175
Lastpage :
178
Abstract :
The characterization of AlxIn1-xAs layers grown on n+-InP substrates by molecular beam epitaxy (MBE) and metal-organic chemical vapor deposition has been carried out by I-V-T, C-V, deep level transient spectroscopy and admittance spectroscopy measurements. Three defect levels E1, E2, and E3 were observed in both material systems and their densities were found to increase rapidly from ~1012 cm-3 to ~1016 cm-3 as the growth temperature was decreased from 740°C to 500°C. The increased defect density was found to be correlated with the decrease of the barrier height of the Schottky diodes, and the appearance of defect-assisted tunneling current in MBE-diodes. The activation energy of the defect E3 was found to increase with increasing AlAs mole fraction, and likely correlating with the Γ-conduction band of AlInAs materials
Keywords :
III-V semiconductors; Schottky diodes; aluminium compounds; chemical vapour deposition; conduction bands; deep level transient spectroscopy; electric admittance; indium compounds; molecular beam epitaxial growth; semiconductor epitaxial layers; semiconductor growth; semiconductor thin films; tunnelling; 740 to 500 degC; AlInAs; C-V measurements; E1 defect; E2 defect; E3 defect; I-V-T measurements; Schottky diodes; admittance spectroscopy; barrier height; conduction band; deep level transient spectroscopy; defect density; defect-assisted tunneling current; metal-organic chemical vapor deposition; molecular beam epitaxy; Admittance measurement; Capacitance measurement; Conducting materials; Insulation; MOCVD; Metal-insulator structures; Molecular beam epitaxial growth; Schottky diodes; Temperature; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1993. Conference Proceedings., Fifth International Conference on
Conference_Location :
Paris
Print_ISBN :
0-7803-0993-6
Type :
conf
DOI :
10.1109/ICIPRM.1993.380681
Filename :
380681
Link To Document :
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