• DocumentCode
    2502989
  • Title

    Detection of gate-oxide defects with timing tests at reduced power supply

  • Author

    Qian, Xi ; Han, Chao ; Singh, Adit D.

  • Author_Institution
    ECE Dept., Auburn Univ., Auburn, AL, USA
  • fYear
    2012
  • fDate
    23-25 April 2012
  • Firstpage
    120
  • Lastpage
    126
  • Abstract
    In this paper, we focus on the detection of small gate-oxide defects, which can escape production tests but lead to early-life-failures (ELF) during normal operation. Very-Low-Voltage (VLV) and MinVDD testing have been proposed in the past to screen such “weak” ICs. However, small defects that are not severe enough to trigger logic failures can still escape such tests given the fact that power supply voltage cannot be arbitrarily lowered in a given technology. We suggest a novel approach for increasing the sensitivity of detection of these small gate-oxide defects by applying timing tests in a reduced power supply environment. While not severe enough to cause logic failures, small oxide defects can still introduce observable anomalies in the timing of affected paths, which is amplified at reduced power supply voltages. Experimental simulation results using NanGate 45nm technology are provided to substantiate our conclusions.
  • Keywords
    CMOS integrated circuits; integrated circuit reliability; integrated circuit testing; power integrated circuits; ELF; early-life-failures; gate-oxide defect detection; integrated circuits; logic failures; power supply; production tests; timing tests; Delay; Logic gates; Power supplies; Resistance; Sensitivity; Transistors; Gate-Oxide Defect; Reduced Power Supply Test; Relative Ranking;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Test Symposium (VTS), 2012 IEEE 30th
  • Conference_Location
    Hyatt Maui, HI
  • ISSN
    1093-0167
  • Print_ISBN
    978-1-4673-1073-4
  • Type

    conf

  • DOI
    10.1109/VTS.2012.6231090
  • Filename
    6231090