DocumentCode
2502989
Title
Detection of gate-oxide defects with timing tests at reduced power supply
Author
Qian, Xi ; Han, Chao ; Singh, Adit D.
Author_Institution
ECE Dept., Auburn Univ., Auburn, AL, USA
fYear
2012
fDate
23-25 April 2012
Firstpage
120
Lastpage
126
Abstract
In this paper, we focus on the detection of small gate-oxide defects, which can escape production tests but lead to early-life-failures (ELF) during normal operation. Very-Low-Voltage (VLV) and MinVDD testing have been proposed in the past to screen such “weak” ICs. However, small defects that are not severe enough to trigger logic failures can still escape such tests given the fact that power supply voltage cannot be arbitrarily lowered in a given technology. We suggest a novel approach for increasing the sensitivity of detection of these small gate-oxide defects by applying timing tests in a reduced power supply environment. While not severe enough to cause logic failures, small oxide defects can still introduce observable anomalies in the timing of affected paths, which is amplified at reduced power supply voltages. Experimental simulation results using NanGate 45nm technology are provided to substantiate our conclusions.
Keywords
CMOS integrated circuits; integrated circuit reliability; integrated circuit testing; power integrated circuits; ELF; early-life-failures; gate-oxide defect detection; integrated circuits; logic failures; power supply; production tests; timing tests; Delay; Logic gates; Power supplies; Resistance; Sensitivity; Transistors; Gate-Oxide Defect; Reduced Power Supply Test; Relative Ranking;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Test Symposium (VTS), 2012 IEEE 30th
Conference_Location
Hyatt Maui, HI
ISSN
1093-0167
Print_ISBN
978-1-4673-1073-4
Type
conf
DOI
10.1109/VTS.2012.6231090
Filename
6231090
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