• DocumentCode
    2503242
  • Title

    Chemical kinetic model of interfacial degradation of adhesive joints

  • Author

    Lam, David C C ; Yang, Fan ; Tong, Pin

  • Author_Institution
    Dept. of Mech. Eng., Hong Kong Univ. of Sci. & Technol., Kowloon, Hong Kong
  • fYear
    1998
  • fDate
    28-30 Sep 1998
  • Firstpage
    44
  • Lastpage
    48
  • Abstract
    The mechanical properties of adhesive joints are degraded in the presence of water. The progressive decrease in strength has been attributed to propagation of interfacial cracks. Water diffusion and the stress distribution within the joint as a function of time are modeled using the finite element method in this study. The stress history at the interface showed spatially invariant characteristics similar to that of interfacial water concentration history as a function of diffusion. The water-stress history along the interface can be modeled as a function dependent principally on water concentration, and is independent of position. On this basis, a chemical kinetic model is proposed to explain the joint strength degradation data reported in literature
  • Keywords
    adhesives; circuit reliability; cracks; failure analysis; finite element analysis; interface phenomena; internal stresses; mechanical strength; moisture; packaging; reaction kinetics; stress analysis; surface chemistry; adhesive joint model; adhesive joints; chemical kinetic model; finite element method; interface stress history; interface water-stress history; interfacial crack propagation; interfacial degradation; interfacial water concentration history; joint strength degradation; mechanical properties; mechanical strength; spatially invariant stress characteristics; stress distribution; water concentration; water degradation; water diffusion; Chemicals; Curing; Degradation; Finite element methods; History; Kinetic theory; Polymers; Residual stresses; Thermal stresses; Water;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Adhesive Joining and Coating Technology in Electronics Manufacturing, 1998. Proceedings of 3rd international Conference on
  • Conference_Location
    Binghamton, NY
  • Print_ISBN
    0-7803-4934-2
  • Type

    conf

  • DOI
    10.1109/ADHES.1998.742001
  • Filename
    742001