DocumentCode
2503622
Title
Fabrication of amorphous silicon solar cells with high performance such as fill factor of 0.77 and conversion efficiency of 12.0%
Author
Fukuda, N. ; Tanaka, H. ; Miyachi, K. ; Ashida, Y. ; Ohashi, Y. ; Nitta, A.
Author_Institution
Mitsui Toatsu Chem. Inc., Yokohama, Japan
fYear
1988
fDate
1988
Firstpage
247
Abstract
The fill factor for hydrogenated amorphous silicon solar cells was improved by using an intrinsic layer with lower space-charge density, and by using a p/i interface layer with a small amount of hydrogen evolved in the low-temperature region. Using these improvements as well as a high-performance p-type layer for the fabrication of solar cells resulted in a high conversion efficiency. The fabrication and properties of solar cells are presented.
Keywords
amorphous semiconductors; elemental semiconductors; hydrogen; silicon; solar cells; 12 percent; amorphous Si:H solar cells; conversion efficiency; elemental semiconductors; fabrication; fill factor; high-performance p-type layer; intrinsic layer; p/i interface layer; space-charge density; Amorphous materials; Amorphous silicon; Fabrication; Hydrogen; Optical films; Photovoltaic cells; Plasma chemistry; Plasma measurements; Plasma properties; Power system reliability; Space charge;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 1988., Conference Record of the Twentieth IEEE
Conference_Location
Las Vegas, NV, USA
Type
conf
DOI
10.1109/PVSC.1988.105696
Filename
105696
Link To Document