DocumentCode :
2503994
Title :
Reactive Ion Beam Etching for VHF Crystal Resonators
Author :
Wang, J.S. ; Watson, S.K. ; Lau, K.F.
fYear :
1984
fDate :
May 29 1984-June 1 1984
Firstpage :
101
Lastpage :
104
Keywords :
Argon; Biomembranes; Chemical processes; Dry etching; Fabrication; Frequency; Gases; Ion beams; Milling; Surface finishing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
38th Annual Symposium on Frequency Control. 1984
Conference_Location :
Philadelphia, Pennsylvania, USA
Type :
conf
DOI :
10.1109/FREQ.1984.200743
Filename :
1537683
Link To Document :
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