DocumentCode :
2504019
Title :
Open-circuit voltage of p-i-n a-Si based solar cells
Author :
Yoshida, T. ; Fujikake, S. ; Shimabukuro, H. ; Ichikawa, Y. ; Sakai, H.
Author_Institution :
Fuji Electr. Corp. Res. & Dev. Ltd., Kanagawa, Japan
fYear :
1988
fDate :
1988
Firstpage :
335
Abstract :
Experimental studies were conducted to understand the behavior of the open-circuit voltage (Voc) in a-Si based p-i-n solar cells. Jd-V curves for p-i-n solar cells having various structures were measured and analyzed to understand the transport mechanism of the dark current. It was found that Jd (dark current) was mainly due to the recombination current at the p/i interface region, and Voc was proportional to the voltage shift of the Jd-V curve to a higher voltage. It was also found that the effective thickness of the interface region was 100 AA and the junction structure of this region was governed by the Jd-V characteristics and Voc.
Keywords :
amorphous semiconductors; carrier lifetime; elemental semiconductors; photoconductivity; silicon; solar cells; Si solar cells; amorphous semiconductors; dark current; junction structure; open-circuit voltage; p-i-n; recombination current; transport mechanism; voltage shift; Current density; Current measurement; Dark current; Glass; P-i-n diodes; PIN photodiodes; Photonic band gap; Photovoltaic cells; Plasma temperature; Research and development; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 1988., Conference Record of the Twentieth IEEE
Conference_Location :
Las Vegas, NV, USA
Type :
conf
DOI :
10.1109/PVSC.1988.105717
Filename :
105717
Link To Document :
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