DocumentCode :
2504336
Title :
High-frequency and noise characteristics of advanced Si and Si/SiGe bipolar transistors
Author :
Aufinger, K. ; Knapp, H. ; Boguth, S. ; Meister, T.F. ; Böck, J. ; Wurzer, M. ; Zöschg, D. ; Treitinger, L.
Author_Institution :
Infineon Technol. AG, Munich, Germany
fYear :
2000
fDate :
2000
Firstpage :
408
Lastpage :
411
Abstract :
The high-frequency and noise characteristics of advanced silicon-based bipolar transistors are presented and discussed. For the design of receivers both the noise at the RF signal carrier frequency and the phase noise of the system are critical issues. The first is dominated by the high-frequency noise properties of the transistors in the first amplifying stage of the receiver, the latter is influenced by the upconversion of the low-frequency noise of the devices. Hence both important frequency regions are included in this work. Implications for circuits are given
Keywords :
bipolar transistors; elemental semiconductors; phase noise; radio receivers; radiofrequency amplifiers; radiofrequency oscillators; silicon; silicon compounds; HF characteristics; RF signal carrier frequency; Si; SiGe; amplifier; bipolar transistors; elemental semiconductor; low noise amplifier; low-frequency noise; noise characteristics; oscillator design; phase noise; receiver design; silicon-based bipolar transistors; transistors; upconversion; Bipolar transistors; Circuit noise; Cutoff frequency; Germanium silicon alloys; Integrated circuit noise; Low-frequency noise; Noise figure; Phase noise; Radio frequency; Silicon germanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
EUROCOMM 2000. Information Systems for Enhanced Public Safety and Security. IEEE/AFCEA
Conference_Location :
Munich
Print_ISBN :
0-7803-6323-X
Type :
conf
DOI :
10.1109/EURCOM.2000.874844
Filename :
874844
Link To Document :
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