• DocumentCode
    2504336
  • Title

    High-frequency and noise characteristics of advanced Si and Si/SiGe bipolar transistors

  • Author

    Aufinger, K. ; Knapp, H. ; Boguth, S. ; Meister, T.F. ; Böck, J. ; Wurzer, M. ; Zöschg, D. ; Treitinger, L.

  • Author_Institution
    Infineon Technol. AG, Munich, Germany
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    408
  • Lastpage
    411
  • Abstract
    The high-frequency and noise characteristics of advanced silicon-based bipolar transistors are presented and discussed. For the design of receivers both the noise at the RF signal carrier frequency and the phase noise of the system are critical issues. The first is dominated by the high-frequency noise properties of the transistors in the first amplifying stage of the receiver, the latter is influenced by the upconversion of the low-frequency noise of the devices. Hence both important frequency regions are included in this work. Implications for circuits are given
  • Keywords
    bipolar transistors; elemental semiconductors; phase noise; radio receivers; radiofrequency amplifiers; radiofrequency oscillators; silicon; silicon compounds; HF characteristics; RF signal carrier frequency; Si; SiGe; amplifier; bipolar transistors; elemental semiconductor; low noise amplifier; low-frequency noise; noise characteristics; oscillator design; phase noise; receiver design; silicon-based bipolar transistors; transistors; upconversion; Bipolar transistors; Circuit noise; Cutoff frequency; Germanium silicon alloys; Integrated circuit noise; Low-frequency noise; Noise figure; Phase noise; Radio frequency; Silicon germanium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    EUROCOMM 2000. Information Systems for Enhanced Public Safety and Security. IEEE/AFCEA
  • Conference_Location
    Munich
  • Print_ISBN
    0-7803-6323-X
  • Type

    conf

  • DOI
    10.1109/EURCOM.2000.874844
  • Filename
    874844