DocumentCode
2504336
Title
High-frequency and noise characteristics of advanced Si and Si/SiGe bipolar transistors
Author
Aufinger, K. ; Knapp, H. ; Boguth, S. ; Meister, T.F. ; Böck, J. ; Wurzer, M. ; Zöschg, D. ; Treitinger, L.
Author_Institution
Infineon Technol. AG, Munich, Germany
fYear
2000
fDate
2000
Firstpage
408
Lastpage
411
Abstract
The high-frequency and noise characteristics of advanced silicon-based bipolar transistors are presented and discussed. For the design of receivers both the noise at the RF signal carrier frequency and the phase noise of the system are critical issues. The first is dominated by the high-frequency noise properties of the transistors in the first amplifying stage of the receiver, the latter is influenced by the upconversion of the low-frequency noise of the devices. Hence both important frequency regions are included in this work. Implications for circuits are given
Keywords
bipolar transistors; elemental semiconductors; phase noise; radio receivers; radiofrequency amplifiers; radiofrequency oscillators; silicon; silicon compounds; HF characteristics; RF signal carrier frequency; Si; SiGe; amplifier; bipolar transistors; elemental semiconductor; low noise amplifier; low-frequency noise; noise characteristics; oscillator design; phase noise; receiver design; silicon-based bipolar transistors; transistors; upconversion; Bipolar transistors; Circuit noise; Cutoff frequency; Germanium silicon alloys; Integrated circuit noise; Low-frequency noise; Noise figure; Phase noise; Radio frequency; Silicon germanium;
fLanguage
English
Publisher
ieee
Conference_Titel
EUROCOMM 2000. Information Systems for Enhanced Public Safety and Security. IEEE/AFCEA
Conference_Location
Munich
Print_ISBN
0-7803-6323-X
Type
conf
DOI
10.1109/EURCOM.2000.874844
Filename
874844
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