DocumentCode

2504661

Title

A new write head trimmed at wafer level by focused ion beam

Author

Koshikawa, Takanori ; Nagai, Akihiko ; Yokoyama, Yoshisato ; Hoshino, Takashi

Author_Institution

Fujitsu Ltd.

fYear

1998

fDate

6-9 Jan. 1998

Firstpage

179

Lastpage

179

Keywords

Degradation; Etching; Fabrication; Inductance; Ion beams; Magnetic heads; Manufacturing; Protection; Spin valves; Transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

MMM-Intermag Conference, 1998. Abstracts., The 7th Joint

Conference_Location

San Francisco, CA, USA

Print_ISBN

0-7803-5118-5

Type

conf

DOI

10.1109/INTMAG.1998.742081

Filename

742081