Title :
Hostaflon TFM “second generation” fluoropolymer for improved contamination control
Author :
Schlipf, Michael ; Lohr, Gernot ; Hintzer, Klaus ; Abate, Jim ; Spell, Rob
Author_Institution :
Dyneon, Germany
Abstract :
Polytetrafluoroethylene (PTFE) and per-fluorinated fluorothermoplastics such as PFA, a copolymer of tetrafluoroethylene with some 4 wt% perfluoroalkylvinylether, have become materials of choice in semiconductor manufacturing machinery for critical chemical and gas interface components. Hostaflon TFM, the 2nd generation PTFE, complements PFA in semiconductor applications in a way that cannot be achieved by non-modified PTFE. This paper identifies the benefits in contamination control and reliability of Hostaflon TFM components used in the semiconductor manufacturing industry
Keywords :
polymers; semiconductor technology; surface contamination; Hostaflon TFM; PFA; PTFE; chemical component; contamination control; gas interface component; perfluorinated fluorothermoplastic; polytetrafluoroethylene; second generation fluoropolymer; semiconductor manufacturing; tetrafluoroethylene perfluoroalkylvinylether copolymer; Bonding; Bones; Chemicals; Machinery; Polarization; Polymers; Semiconductor device manufacture; Semiconductor materials; Surface contamination; Viscosity;
Conference_Titel :
Electronics Manufacturing Technology Symposium, 1996., Nineteenth IEEE/CPMT
Conference_Location :
Austin, TX
Print_ISBN :
0-7803-3642-9
DOI :
10.1109/IEMT.1996.559734
