Title :
Chemical Polishing in Etching Solutions That Contain Surfactants
Author :
Brandmayr, Ronald J. ; Vig, John R.
Keywords :
Chemical processes; Chemical technology; Crystals; Etching; Frequency; Hafnium; Laboratories; Resists; Surface cleaning; Surface contamination;
Conference_Titel :
39th Annual Symposium on Frequency Control. 1985
Conference_Location :
Philadelphia, Pennsylvania, USA
DOI :
10.1109/FREQ.1985.200857
