DocumentCode :
2506289
Title :
Etch Processing of Bulk and Surface Wave Devices
Author :
Dowsett, John ; Dwyer, Douglas F G ; Stern, Francesca ; Heinecke, R.A. ; Truelove, A.H.
fYear :
1985
fDate :
29-31 May 1985
Firstpage :
301
Lastpage :
310
Keywords :
Chemical technology; Crystalline materials; Etching; Plasma applications; Plasma devices; Plasma materials processing; Plasma waves; Production; Surface waves; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
39th Annual Symposium on Frequency Control. 1985
Conference_Location :
Philadelphia, Pennsylvania, USA
Type :
conf
DOI :
10.1109/FREQ.1985.200860
Filename :
1537800
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2506289
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