• DocumentCode
    2506298
  • Title

    Optimum design methodology for thermally stable multi-finger power SiGe HBTs

  • Author

    Jin, D.Y. ; Zhang, W.R. ; Guan, B.L. ; Chen, L. ; Hu, N. ; Xiao, Y. ; Wang, R.Q.

  • Author_Institution
    Coll. of Electron. Inf. & Control Eng., Beijing Univ. of Technol., Beijing, China
  • fYear
    2010
  • fDate
    10-11 May 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    The two-dimensional temperature profile of a multi-finger power SiGe HBT is studied with the electrothermal model, which shows that there is an uneven temperature profile over the device finger for HBT with uniform finger length. Because of the positive current-temperature feedback, the uneven temperature profile will leads to an anomalous current distribution, which eventually caused the thermal instability. To improve the uneven temperature profile and enhance the thermal stability, the HBT with non-uniform finger length is designed. Considering that designing multiple finger length values becomes trivial and time-consuming for the HBT with dozens of emitter fingers, a new thermal design methodology namely Grouping and Adjusting (GA) method is proposed to shorten design time. Taking 30-finger HBT for example, a detailed design procedure is present. The calculated results show both significant improvement on the peak temperature and the uniformity of SiGe HBT with non-uniform finger length.
  • Keywords
    Ge-Si alloys; heterojunction bipolar transistors; power bipolar transistors; thermal stability; SiGe; current-temperature feedback; electrothermal model; emitter finger; grouping and adjusting method; optimum design methodology; thermal design methodology; thermal instability; thermally stable multifinger power SiGe HBT; two-dimensional temperature profile; Current distribution; Design methodology; Electrothermal effects; Feedback; Fingers; Germanium silicon alloys; Heterojunction bipolar transistors; Silicon germanium; Temperature distribution; Thermal stability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Junction Technology (IWJT), 2010 International Workshop on
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4244-5866-0
  • Type

    conf

  • DOI
    10.1109/IWJT.2010.5474901
  • Filename
    5474901