DocumentCode :
2507022
Title :
Carbon nanotube thin film transistor devices
Author :
Wei, J. ; Lee, C.W. ; Li, L.J.
Author_Institution :
Singapore Inst. of Manuf. Technol., Singapore, Singapore
fYear :
2010
fDate :
10-11 May 2010
Firstpage :
1
Lastpage :
5
Abstract :
In this study, it was demonstrated that full semiconductor device yield can be achieved using SWNT solutions prepared by selective functionalization of SWNTs with diazonium reagents and followed by density gradient ultracentrifugation (DGU) to remove most of M species and impurities. By increasing the network thickness, the effective mobility of the devices can be raised to ~10 cm2/V-s while keeping the on-off ratio higher than 5000. According to the positive relationship between effective mobility and network thickness, it is possible to tune the mobility of solution processed SWNT transistors by controlling the thickness of SWNT films. The removal of impurities is found to be essential for achieving high on-off ratio devices. Instead, removal of M species is crucial to obtain good on-off characteristics. It is speculated that the achievement of the full semiconductor device yield using the SWNTs consisting of small diameter tubes is due to the significant differences between chiralities in terms of the reactivity with diazonium salts.
Keywords :
carbon nanotubes; thin film transistors; SWNT transistor; carbon nanotube thin film transistor device; density gradient ultracentrifugation; diazonium reagent; single-walled carbon nanotube; Carbon nanotubes; FETs; Fabrication; Materials science and technology; Semiconductor device manufacture; Semiconductor devices; Semiconductor films; Semiconductor impurities; Thickness control; Thin film transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Junction Technology (IWJT), 2010 International Workshop on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-5866-0
Type :
conf
DOI :
10.1109/IWJT.2010.5474971
Filename :
5474971
Link To Document :
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