DocumentCode
2510245
Title
A self-tuning EWMA controller utilizing artificial neural network function approximation techniques
Author
Smith, Taber ; Boning, Duane
Author_Institution
Microsystems Technol. Lab., MIT, Cambridge, MA, USA
fYear
1996
fDate
14-16 Oct 1996
Firstpage
355
Lastpage
363
Abstract
Recent works have shown that an exponentially weighted moving average (EWMA) controller can be used on semiconductor processes to maintain process targets over extended periods for improved product quality and decreased machine downtime. Proper choice of controller parameters (EWMA weights) is critical to the performance of this system. This work examines how different process factors affect the optimal controller parameters. We show that a function mapping from the disturbance state (magnitude of linear drift and random noise) of a given process to the corresponding optimal EWMA weights can be generated, and an artificial neural network (ANN) trained to learn the mapping. A self-tuning EWMA controller is proposed which dynamically updates its controller parameters by estimating the disturbance state and using the ANN function mapping to provide updates to the controller parameters. The result is an adaptive controller which eliminates the need for an experienced engineer to tune the controller, thereby allowing it to be more easily applied to semiconductor processes
Keywords
adaptive control; controllers; function approximation; moving average processes; neurocontrollers; optimal control; self-adjusting systems; semiconductor device manufacture; adaptive controller; artificial neural network; exponentially weighted moving average; function approximation; linear drift; optimal controller; random noise; self-tuning EWMA controller; semiconductor processing; Adaptive control; Artificial neural networks; Control systems; Noise generators; Optimal control; Parameter estimation; Programmable control; Semiconductor device noise; State estimation; Weight control;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronics Manufacturing Technology Symposium, 1996., Nineteenth IEEE/CPMT
Conference_Location
Austin, TX
ISSN
1089-8190
Print_ISBN
0-7803-3642-9
Type
conf
DOI
10.1109/IEMT.1996.559755
Filename
559755
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