Title :
Photodefinable polyimides. II. The characterization and processing of photosensitive polyimide systems
Author :
Pottiger, Michael T. ; Goff, David L. ; Lautenberger, William J.
Author_Institution :
E.I. du Pont de Nemours & Co., Wilmington, DE, USA
Abstract :
Two negative-working photodefinable polyimides with different backbones have been prepared using a four-step synthesis process based on polyiminolactone chemistry. These polyimides have been formulated, coated onto silicon wafers, patterned directly using standard UV microphotolithography, and thermally cured to produce polyimide relief structures. Aspects of the synthesis and processing are discussed, and the properties of the two polyimides after curing are compared.<>
Keywords :
photolithography; polymer films; Si; UV photolithography; backbone chemistry; characterization; coated onto silicon wafers; four-step synthesis process; negative-working photodefinable polyimides; photosensitive polyimide systems; polyimide relief structures; polyimides after curing; polyiminolactone chemistry; processing; properties; standard UV microphotolithography; thermally cured; Chemistry; Inorganic materials; Insulation; Materials reliability; Microelectronics; Polyimides; Polymers; Resists; Silicon; Spine;
Conference_Titel :
Electronics Components Conference, 1988., Proceedings of the 38th
Conference_Location :
Los Angeles, CA, USA
DOI :
10.1109/ECC.1988.12610
