DocumentCode
2511680
Title
Application of machine learning to manufacturing: results from metal etch
Author
Chatterjee, Arun ; Croley, David ; Ramamurti, Viswanath ; Chang, Kui-yu
Author_Institution
Adv. Comput. Archit. Lab., Motorola Inc., Austin, TX, USA
fYear
1996
fDate
14-16 Oct 1996
Firstpage
372
Lastpage
377
Abstract
With the increasing availability of huge quantities of manufacturing data, and the pressures of continuous process improvement and scrap reduction, engineers are beginning to use machine learning techniques along with traditional statistical methods. In this paper, we discuss the application of standard machine learning techniques to analyze, classify, and predict the quality of metal etch using RIE. Three types of data were used to characterize a metal etch: in-process sensor data from the etch chamber, metrology data for critical dimension measurements before and after etch, and metal resistance measurements from probe tests. Three machine learning paradigms were applied: neural networks, induction learning, and case-based reasoning. This paper describes the techniques used, the results obtained, and the conclusions drawn
Keywords
learning (artificial intelligence); production engineering computing; sputter etching; RIE; case-based reasoning; critical dimension; induction learning; machine learning; manufacturing; metal etch; neural network; resistance; sensor; Data engineering; Electrical resistance measurement; Etching; Machine learning; Manufacturing processes; Metrology; Probes; Sensor phenomena and characterization; Statistical analysis; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronics Manufacturing Technology Symposium, 1996., Nineteenth IEEE/CPMT
Conference_Location
Austin, TX
ISSN
1089-8190
Print_ISBN
0-7803-3642-9
Type
conf
DOI
10.1109/IEMT.1996.559762
Filename
559762
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