• DocumentCode
    2511680
  • Title

    Application of machine learning to manufacturing: results from metal etch

  • Author

    Chatterjee, Arun ; Croley, David ; Ramamurti, Viswanath ; Chang, Kui-yu

  • Author_Institution
    Adv. Comput. Archit. Lab., Motorola Inc., Austin, TX, USA
  • fYear
    1996
  • fDate
    14-16 Oct 1996
  • Firstpage
    372
  • Lastpage
    377
  • Abstract
    With the increasing availability of huge quantities of manufacturing data, and the pressures of continuous process improvement and scrap reduction, engineers are beginning to use machine learning techniques along with traditional statistical methods. In this paper, we discuss the application of standard machine learning techniques to analyze, classify, and predict the quality of metal etch using RIE. Three types of data were used to characterize a metal etch: in-process sensor data from the etch chamber, metrology data for critical dimension measurements before and after etch, and metal resistance measurements from probe tests. Three machine learning paradigms were applied: neural networks, induction learning, and case-based reasoning. This paper describes the techniques used, the results obtained, and the conclusions drawn
  • Keywords
    learning (artificial intelligence); production engineering computing; sputter etching; RIE; case-based reasoning; critical dimension; induction learning; machine learning; manufacturing; metal etch; neural network; resistance; sensor; Data engineering; Electrical resistance measurement; Etching; Machine learning; Manufacturing processes; Metrology; Probes; Sensor phenomena and characterization; Statistical analysis; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Manufacturing Technology Symposium, 1996., Nineteenth IEEE/CPMT
  • Conference_Location
    Austin, TX
  • ISSN
    1089-8190
  • Print_ISBN
    0-7803-3642-9
  • Type

    conf

  • DOI
    10.1109/IEMT.1996.559762
  • Filename
    559762