DocumentCode :
2511680
Title :
Application of machine learning to manufacturing: results from metal etch
Author :
Chatterjee, Arun ; Croley, David ; Ramamurti, Viswanath ; Chang, Kui-yu
Author_Institution :
Adv. Comput. Archit. Lab., Motorola Inc., Austin, TX, USA
fYear :
1996
fDate :
14-16 Oct 1996
Firstpage :
372
Lastpage :
377
Abstract :
With the increasing availability of huge quantities of manufacturing data, and the pressures of continuous process improvement and scrap reduction, engineers are beginning to use machine learning techniques along with traditional statistical methods. In this paper, we discuss the application of standard machine learning techniques to analyze, classify, and predict the quality of metal etch using RIE. Three types of data were used to characterize a metal etch: in-process sensor data from the etch chamber, metrology data for critical dimension measurements before and after etch, and metal resistance measurements from probe tests. Three machine learning paradigms were applied: neural networks, induction learning, and case-based reasoning. This paper describes the techniques used, the results obtained, and the conclusions drawn
Keywords :
learning (artificial intelligence); production engineering computing; sputter etching; RIE; case-based reasoning; critical dimension; induction learning; machine learning; manufacturing; metal etch; neural network; resistance; sensor; Data engineering; Electrical resistance measurement; Etching; Machine learning; Manufacturing processes; Metrology; Probes; Sensor phenomena and characterization; Statistical analysis; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Manufacturing Technology Symposium, 1996., Nineteenth IEEE/CPMT
Conference_Location :
Austin, TX
ISSN :
1089-8190
Print_ISBN :
0-7803-3642-9
Type :
conf
DOI :
10.1109/IEMT.1996.559762
Filename :
559762
Link To Document :
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