DocumentCode :
2512509
Title :
Monitoring and analyzing the dynamic junction temperature distribution of RF power transistors by using RM-50 infrared micro imager
Author :
Guang-bo Gao ; Zhu, Jin-jin ; Wu, Wa-chen
Author_Institution :
Beijing Polytech. Univ., China
fYear :
1988
fDate :
10-12 Feb 1988
Firstpage :
84
Lastpage :
87
Abstract :
The authors describe experiments carried out on three types of RF power transistors typically used in the power amplifiers of communication systems. Because of differences found when measuring junction temperatures, a dynamic heat resistance concept was formulated to describe the dynamic thermal characteristics of RF power transistors. Using this concept, the handling capability, burn-in testing, life testing, and the reliability design of RF power transistors were studied. Among the results presented, it was found that the dynamic peak heat resistance is generally lower than the steady peak heat resistance, and steady peak heat resistance is more sensitive than the dynamic peak heat resistance to increasing DC voltage
Keywords :
infrared imaging; life testing; power amplifiers; power transistors; reliability; semiconductor device testing; thermal resistance measurement; thermal variables measurement; RF power transistors; RM-50 infrared micro imager; burn-in testing; communication systems; dynamic junction temperature distribution; dynamic peak heat resistance; dynamic thermal characteristics; junction temperature measurement; life testing; power amplifiers; reliability design; steady peak heat resistance; Electrical resistance measurement; Life testing; Monitoring; Power amplifiers; Power transistors; Radio frequency; Radiofrequency amplifiers; Resistance heating; Temperature; Thermal resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Thermal and Temperature Measurement Symposium, 1988. SEMI-THERM IV., Fourth Annual IEEE
Conference_Location :
San Diego, CA
Type :
conf
DOI :
10.1109/SEMTHE.1988.10602
Filename :
10602
Link To Document :
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