• DocumentCode
    2512860
  • Title

    Life issues, robustness consequences and reliability challenges for Very Deep Sub Micron technologies

  • Author

    Perdu, Philippe

  • Author_Institution
    DCT/AQ/LE, CNES, Toulouse, France
  • fYear
    2010
  • fDate
    12-16 April 2010
  • Firstpage
    1014
  • Lastpage
    1019
  • Abstract
    Reliability and robustness are strongly linked: aging amplifies robustness issues while environmental stress accelerates aging. As Very Deep Sub Micron (VDSM) technologies offer early wear out and intrinsically lower margins, lifetime and EMC become a coupled challenge that underlines the need of a complete and multidisciplinary approach joining EMC, reliability, device characterization and internal testing skills. Trends, proof of evidence and internal testing approach are described in order to emphasize the need of device aging consideration in robustness studies.
  • Keywords
    VLSI; electromagnetic compatibility; integrated circuit reliability; EMC; VDSM technology; device aging; device characterization; environmental stress; internal testing skills; very deep sub micron technology; Accelerated aging; Electromagnetic compatibility; Embedded system; Integrated circuit reliability; Internal stresses; Inverters; Power supplies; Power system reliability; Robustness; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electromagnetic Compatibility (APEMC), 2010 Asia-Pacific Symposium on
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-5621-5
  • Type

    conf

  • DOI
    10.1109/APEMC.2010.5475630
  • Filename
    5475630