• DocumentCode
    2514231
  • Title

    Electrical modelling of temperature distributions in on-chip interconnects, packaging, and 3D integration

  • Author

    Jiang, Lijun ; Xu, Chuan ; Smith, Howard ; Rubin, Barry ; Deutsch, Alina ; Caron, Alain

  • Author_Institution
    EDA, T.J. Watson Res. Center, IBM, Yorktown Heights, NY, USA
  • fYear
    2010
  • fDate
    12-16 April 2010
  • Firstpage
    625
  • Lastpage
    628
  • Abstract
    In this talk, we will introduce a novel methodology using existing electromagnetic modelling tools for interconnect and packaging structures to simulate and model the temperature distribution without major modifications to these tools or simulated structures. This methodology can easily be integrated with the chip technology information and frame an electrical circuit simulator into an automatic, template-based simulation and optimization flow. A new accurate closed-form thermal model is further developed to simplify unnecessary object details. The model allows an equivalent medium with effective thermal conductivity (isotropic or anisotropic) to replace details in non-critical regions accurately so that complex interconnect structures can be simulated at a system level. Using these techniques, we demonstrate the modelling capability of very complex on-chip interconnects, packaging, and 3D integration technologies.
  • Keywords
    VLSI; circuit simulation; integrated circuit interconnections; integrated circuit packaging; temperature distribution; thermal conductivity; 3D integration technology; closed-form thermal model; effective thermal conductivity; electrical circuit simulator; interconnect structures; on-chip interconnects; on-chip packaging; optimization flow; system level simulation; temperature distribution electrical modelling; template-based simulation; Circuit simulation; Electric resistance; Electromagnetic modeling; Electronic packaging thermal management; Integrated circuit interconnections; Laplace equations; Temperature distribution; Thermal conductivity; Thermal resistance; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electromagnetic Compatibility (APEMC), 2010 Asia-Pacific Symposium on
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-5621-5
  • Type

    conf

  • DOI
    10.1109/APEMC.2010.5475701
  • Filename
    5475701