A multiple model approach to process control in electronics manufacturing

Author

Krauss, A.F. ; Kamen, E.W.

Author_Institution

Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA

fYear

1996

fDate

14-16 Oct 1996

Firstpage

455

Lastpage

461

Abstract

In the first part of the paper, simulations are given of process control methods based on EWMA and single Kalman filter techniques which have already been applied to microelectronics manufacturing. Then a new approach to process control is proposed which is based on interactive multiple model (IMM) Kalman filtering. The application of this new approach to polymer deposition is discussed and simulations are given based on an approximation of process behavior. The results indicate that basing process control on multiple-model estimation can reduce the output variance when the process parameters are varying within the realm of a small number of known modes

Keywords

Kalman filters; integrated circuit manufacture; moving average processes; polymer films; process control; EWMA; Kalman filter; electronics manufacturing; interactive multiple model; microelectronics; polymer deposition; process control; simulation; Computer aided manufacturing; Filtering; Kalman filters; Manufacturing processes; Microelectronics; Neural networks; Process control; Pulp manufacturing; Semiconductor process modeling; Virtual manufacturing;

fLanguage

English

Publisher

ieee

Conference_Titel

Electronics Manufacturing Technology Symposium, 1996., Nineteenth IEEE/CPMT

Conference_Location

Austin, TX

ISSN

1089-8190

Print_ISBN

0-7803-3642-9

Type

conf

DOI

10.1109/IEMT.1996.559787

Filename

559787