DocumentCode
2516134
Title
Automated reticle handling: a comparison of distributed and centralized reticle storage and transport
Author
Murray, Anne M. ; Miller, David J.
Author_Institution
IBM Microelectron., Hopewell Junction, NY, USA
Volume
2
fYear
2003
fDate
7-10 Dec. 2003
Firstpage
1360
Abstract
The implementation of automated material handling systems (AMHS) in 300 mm semiconductor facilities provides the opportunity to realize significant benefits in fabricator productivity and performance. The leverage associated with automated reticle delivery to photolithography process tools may be less apparent than a fab-wide AMHS. However, a high product mix environment requires the tracking, storage and transportation of thousands of reticles to successfully process wafers on photolithography tools. The failure to deliver reticles in an accurate and timely manner will negate many of the competitive advantages associated with automated wafer handling. Implementing an automated reticle management system (ARMS) requires an evolution from traditional reticle storage and management methodologies. We review the application of simulation analysis to explore centralized versus distributed reticle storage and handling alternatives for an overall ARMS strategy.
Keywords
integrated circuit manufacture; materials handling; photolithography; reticles; 300 mm; automated reticle management system; automated wafer handling; centralized reticle storage; distributed reticle storage; photolithography process tool; semiconductor facility; simulation analysis; Analytical models; Arm; Costs; Investments; Lithography; Material storage; Materials handling; Microelectronics; Productivity; Storage automation;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation Conference, 2003. Proceedings of the 2003 Winter
Print_ISBN
0-7803-8131-9
Type
conf
DOI
10.1109/WSC.2003.1261574
Filename
1261574
Link To Document