• DocumentCode
    2516134
  • Title

    Automated reticle handling: a comparison of distributed and centralized reticle storage and transport

  • Author

    Murray, Anne M. ; Miller, David J.

  • Author_Institution
    IBM Microelectron., Hopewell Junction, NY, USA
  • Volume
    2
  • fYear
    2003
  • fDate
    7-10 Dec. 2003
  • Firstpage
    1360
  • Abstract
    The implementation of automated material handling systems (AMHS) in 300 mm semiconductor facilities provides the opportunity to realize significant benefits in fabricator productivity and performance. The leverage associated with automated reticle delivery to photolithography process tools may be less apparent than a fab-wide AMHS. However, a high product mix environment requires the tracking, storage and transportation of thousands of reticles to successfully process wafers on photolithography tools. The failure to deliver reticles in an accurate and timely manner will negate many of the competitive advantages associated with automated wafer handling. Implementing an automated reticle management system (ARMS) requires an evolution from traditional reticle storage and management methodologies. We review the application of simulation analysis to explore centralized versus distributed reticle storage and handling alternatives for an overall ARMS strategy.
  • Keywords
    integrated circuit manufacture; materials handling; photolithography; reticles; 300 mm; automated reticle management system; automated wafer handling; centralized reticle storage; distributed reticle storage; photolithography process tool; semiconductor facility; simulation analysis; Analytical models; Arm; Costs; Investments; Lithography; Material storage; Materials handling; Microelectronics; Productivity; Storage automation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation Conference, 2003. Proceedings of the 2003 Winter
  • Print_ISBN
    0-7803-8131-9
  • Type

    conf

  • DOI
    10.1109/WSC.2003.1261574
  • Filename
    1261574