Title :
Application of cluster tool modeling to a 300 mm fab simulation
Author :
Shikalgar, Sameer T. ; Fronckowiak, David ; MacNair, Edward A.
Author_Institution :
IBM Microelectron. Div., East Fishkill, NY, USA
Abstract :
300 mm semiconductor wafer fabrication facilities, like conventional semiconductor fabs, contain many different types of tools. We discuss a realistic way of representing cluster tools in a simulation model of the entire line. A more realistic representation of cluster tools results in greater accuracy in the output of the simulation model.
Keywords :
cluster tools; digital simulation; semiconductor device manufacture; wafer-scale integration; 300 mm semiconductor wafer fabrication; cluster tool modeling; conventional semiconductor fab simulation; Fabrication; Microelectronics; Pipelines; Preventive maintenance; Robotics and automation; Robots; Semiconductor device modeling; Statistics;
Conference_Titel :
Simulation Conference, 2003. Proceedings of the 2003 Winter
Print_ISBN :
0-7803-8131-9
DOI :
10.1109/WSC.2003.1261581
